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Polynomial Model of Chemical-Mechanical Planarization in Production of Sub-Micrometer VLSIC
Authors: Amirkhanov A.V. , Gladkikh A.A. , Makarchuk V.V. , Pshennikov A.G. , Shakhnov V.A. | Published: 09.09.2013 |
Published in issue: #2(87)/2012 | |
DOI: | |
Category: Design and technology | |
Keywords: chemical-mechanical planarization, crystal, interlayer insulation, multilevel metallization, planarization range, yield, topology, convolution, polynomial |