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Polynomial Model of Chemical-Mechanical Planarization in Production of Sub-Micrometer VLSIC

Authors: Amirkhanov A.V. , Gladkikh A.A. , Makarchuk V.V. , Pshennikov A.G. , Shakhnov V.A. Published: 09.09.2013
Published in issue: #2(87)/2012  
DOI:

 
Category: Design and technology  
Keywords: chemical-mechanical planarization, crystal, interlayer insulation, multilevel metallization, planarization range, yield, topology, convolution, polynomial

Peculiarities of the technological operation of chemical-mechanical planarization during the formation of interlayer insulation in VLSIC are considered. The model of chemical-mechanical planarization based on the transformed Preston equation and the model taking into account the timedependence of the planarization rate are analyzed. A polynomial model of chemical-mechanical planarization is offered. The results of simulations using the models under consideration are compared.