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Research into characteristics and methods of resist coating by infrared spectral ellipsometry
| Authors: Makeev M.O., Zverev A.V., Rodionov I.A. | Published: 23.12.2015 |
| Published in issue: #6(105)/2015 | |
| DOI: 10.18698/0236-3933-2015-6-125-134 | |
| Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Design and Instrument Engineering Technology and Electronic Equipment | |
| Keywords: microelectronic devices, lithography, ultraviolet resist, centrifuge process, infrared spectral ellipsometry, layer thickness, optical constants | |