Research into characteristics and methods of resist coating by infrared spectral ellipsometry
Authors: Makeev M.O., Zverev A.V., Rodionov I.A. | Published: 23.12.2015 |
Published in issue: #6(105)/2015 | |
DOI: 10.18698/0236-3933-2015-6-125-134 | |
Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Design and Instrument Engineering Technology and Electronic Equipment | |
Keywords: microelectronic devices, lithography, ultraviolet resist, centrifuge process, infrared spectral ellipsometry, layer thickness, optical constants |
The paper considers both the research into characteristics and evaluation of Ultra-i 123-0.35 resist coating uniformity by using the method of infrared spectral ellipsometry. Optical constants for Ultra-i 123-0.35 resist within the infrared wavelength ranges of 2 to 33 m are determined. The authors find a ratio of the resist layer thickness to the centrifuge rotation rate (2000 to 7000 rpm, rotations per minute). The resist layer thickness nonuniformity is less than 2 % along the surfaces of all samples. This fact suggests the high performance of the coating process. The obtained ratio of the resist layer thickness to the centrifuge rotation rate will be used for choosing some technological modes of Ultra-i 123-0.35 resist coating within the thickness range of250 to 480 nm.
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