Тhickness Distribution Measurement of Multilayer Film Structures by Spectral Reflectometry Methods

We examine the spectral method o f measurement o f multilayer . film structures layers thickness distribution. Moreover, we propose a method of the measurement unit calibration and a method of.filtering the obtained solutions. The methods mentioned are validated experimentally by means of the assembled hyperspectral microscope based on the dual acousto-optical videomonochromator. We analyse the thickness measurement results of the two-layer silicon dioxide (SiO2) film structure and polymethylmethacrylate structure on silicon substrate.

References

[1] Ozaydin-Ince Gozde, Coclite Anna Maria, Gleason Karen K. CVD of polymeric thin films: applications in sensors, biotechnology, microelectronics/organic electronics, microfluidics, MEMS, composites and membranes. Rep. Prog. Phys., 2012, vol. 75, no. 1, p. 016501.

[2] Bader G., Ashrit P.V., Truong V.V. Transmission and reflection ellipsometry of thin films and multilayer systems. Applied Optics, 1998, vol. 37, no. 7, pp. 1146-1151.

[3] Manifacier J.C., Gasiot J., Fillard J.P. A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film. Journal of Physics E: Scientific Instruments, 1976, vol. 9, no. 11, p. 1002.

[4] Ghim Y.S., Suratkar A., Davies A. Reflectometry-based wavelength scanning interferometry for thickness measurements of very thin wafers. Optics Express, 2010, vol. 18, no. 7, pp. 6522-6529.

[5] Tsepulin V.G., Perchik A.V., Tolstoguzov V.L., Karasik V.E. Thin film thickness measurement error reduction by wavelength selection in spectrophotometry. Journal of Physics: Conference Series, 2015, vol. 584.

[6] Kim D. et al. Measurement of the thickness profile of a transparent thin film deposited upon a pattern structure with an acousto-optic tunable filter. Optics Letters, 2002, vol. 27, no. 21, pp. 1893-1895.

[7] Gorodnichev V.A., Belov M.L., Belov A.M., Berezin S.V., Fedotov Yu.V. Laser reflectometry method of measurement of thickness of gold nanofilms on quartz substrate. Nauka i obrazovanie. MGTU im. N.E. Baumana [Science & Education of the Bauman MSTU. Electronic Journal], 2012, no. 3. Available at: http://technomag.bmstu.ru/en/doc/326698.html

[8] Born M., Wolf E. Principles of Optics. Oxford, London, Edinburgh, N.Y., Paris, Frankfurt, Pergamon Press, 1968.

[9] Bates D.M., Watts D.G. Nonlinear Regression Analysis and its Applications. John & Wiley Sons, Inc., 1988.

[10] Perchik A.V., Tolstoguzov V.L., Stasenko K.V., Tsepulin V.G. Spatial distribution of ITO-coating thickness measurement technique by AOTF spectrometer. Jelektr. nauchno-tekh. izd. "Inzhenernyy zhurnal: nauka i innovacii" [El. Sci.-Tech. Publ. "Eng. J.: Science and Innovation"], 2013, iss. 9. DOI: 10.18698/2308-6033-2013-9-915 Available at: http://engjournal.ru/eng/catalog/pribor/optica/915.html