Тhickness Distribution Measurement of Multilayer Film Structures by Spectral Reflectometry Methods

Authors: Tsepulin V.G., Tolstoguzov V.L., Karasik V.Ye., Perchik A.V., Arefev A.P. Published: 15.06.2016
Published in issue: #3(108)/2016  
DOI: 10.18698/0236-3933-2016-3-3-12

Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Instruments and Measuring Methods  
Keywords: multilayer film structures, reflectometry, profilometry, acousto-optical filter, thin films

We examine the spectral method o f measurement o f multilayer . film structures layers thickness distribution. Moreover, we propose a method of the measurement unit calibration and a method of.filtering the obtained solutions. The methods mentioned are validated experimentally by means of the assembled hyperspectral microscope based on the dual acousto-optical videomonochromator. We analyse the thickness measurement results of the two-layer silicon dioxide (SiO2) film structure and polymethylmethacrylate structure on silicon substrate.


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