Error Estimation of Measuring Multilayer Film Coating Thickness by Spectral Reflectometry Method

Authors: Tsepulin V.G., Tolstoguzov V.L., Stepanov R.O., Karasik V.Ye. Published: 28.05.2017
Published in issue: #3(114)/2017  
DOI: 10.18698/0236-3933-2017-3-4-12

Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Instrumentation and Methods to Control Environment, Substances, Materials, and Products  
Keywords: multilayer film structures, reflectometry, profilometry, thin films, thickness measurement errors

This work focuses on an approach to error estimation of measuring multilayer film coating thickness by spectral reflectometry method. The approach is based on the linearized regression model. The measurements of the test coating sample showed that disagreement of random error estimates, obtained by the proposed approach with the experimental values is not more than 30 % for the thickness measured with an accuracy of subnanometer.


[1] Leng J.M., Sidorowich J.J., Yoon Y.D., Opsal J. Simultaneous measurement of six layers in a silicon on insulator film stack using spectrophotometry and beam profile reflectometry. Journal of Applied Physics, 1997, vol. 81, no. 8, pp. 3570-3578. DOI: 10.1063/1.364994 Available at: http://aip.scitation.org/doi/10.1063/1.364994

[2] Kim D., Kim S., Kong H.J., Lee Yu. Measurement of the thickness profile of a transparent thin film deposited upon a pattern structure with an acousto-optic tunable filter. Optics Letters, 2002, vol. 27, no. 21, pp. 1893-1895. DOI: 10.1364/OL.27.001893 Available at: https://www.osapublishing.org/ol/abstract.cfm?uri=ol-27-21-1893&origin=search

[3] Born M., Wolf E. Principles of optics. Pergamon Press, 1959.

[4] Ylilammi M., Rantaaho T. Optical determination of the film thicknesses in multilayer thin film structures. Thin Solid Films, 1993, vol. 232, no. 1, pp. 56-62. DOI: 10.1016/0040-6090(93)90762-E Available at: http://www.sciencedirect.com/science/article/pii/004060909390762E

[5] Konstantinov I., Babeva T., Kitova S. Analysis of errors in thin-film optical parameters derived from spectrophotometric measurements at normal light incidence. Applied Optics, 1998, vol. 37, no. 19, pp. 4260-4267. DOI: 10.1364/AO.37.004260 Available at: https://www.osapublishing.org/ao/abstract.cfm?uri=ao-37-19-4260

[6] Bates D.M., Watts D.G. Nonlinear regression analysis and its applications. John Wiley & Sons, Inc., 1988. 370 p.

[7] Tsepulin V.G., Tolstoguzov V.L., Karasik V.E., Perchik A.V., Arefev A.P. Thickness distribution measurement of multilayer film structures by spectral reflectometry methods. Vestn. Mosk. Gos. Tekh. Univ. im. N.E. Baumana, Priborostr. [Herald of the Bauman Moscow State Tech. Univ., Instrum. Eng.], 2016, no. 3, pp. 3-12 (in Russ.). DOI: 10.18698/0236-3933-2016-3-3-12