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Plasma-Chemical Etching of Thin Silver Films for Applications of Plasmonics by Inductive-Coupled Argon Plasma
| Authors: Filippov I.A., Velikovskiy L.E., Shakhnov V.A. | Published: 22.12.2020 |
| Published in issue: #4(133)/2020 | |
| DOI: 10.18698/0236-3933-2020-4-165-180 | |
| Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Vacuum and Plasma Electronics | |
| Keywords: photonics, plasmonics, plasma-chemical etching, technology, simulation | |