Laser Reflectometric Method of Measuring the Thickness and Optical Characteristics of Thin Films in the Process of Their Growth
| Authors: Belov M.L., Belov A.M., Gorodnichev V.A., Kozintsev V.I., Fedotov Yu.V. | Published: 30.08.2013 |
| Published in issue: #2(83)/2011 | |
| DOI: | |
| Category: Laser and opto-electronic systems | |
| Keywords: thin film, growth, thickness, optical characteristics, laser refractometry | |
The laser reflectometry method is described which makes possible to take the insitu measurements of thickness and the refraction and absorption factors of thin-films in the process of their growth. The method is based on measuring the reflection factors of the “air (vacuum)–film–substrate” system. The genetic algorithm of search for a minimum of the multivariable function is used for numerical solving. The results of mathematical simulation are given which demonstrate the method workability.