TiO₂ Photocatalytic Film Formation by Reactive Magnetron Sputtering using the Guasi-Closed Space

Abstract

The paper considers the influence of quasi-closed space in the technology of reactive pulse magnetron sputtering on the crystalline structure and photocatalytic activity of the obtained TiO₂ films. It provides analysis of modern achievements in the active photocatalytic layer formation technologies and reveals advantages and disadvantages in the existing technologies. The paper describes equipment, sequence and principles of creating the quasi-closed space in a vacuum working chamber. Stages and main process parameters are presented for formation of the photocatalytic films by the reactive pulse magnetron sputtering method with and without introduction of the quasi-closed space. Results of studying the obtained films by the spectrophotometric method are provided, and the transmission spectra are constructed. Results of studying the crystalline structure of the obtained TiO₂ films using the diffractometric method are shown. The paper studies influence of using quasi-closed space in the technology of pulsed reactive magnetron sputtering on the TiO₂ crystalline structure and photocatalytic activity. It describes the technique and equipment to study the films photocatalytic activity based on decomposition of the methylene blue solution. Introducing the quasi-closed space in formation of the TiO₂ films by reactive pulse magnetron sputtering proves an increase in the resulting film photocatalytic activity

Please cite this article in English as:

Shashin D.E., Dyachkov A.D. TiO₂ photocatalytic film formation by reactive magnetron sputtering using the quasi-closed space. Herald of the Bauman Moscow State Technical University, Series Instrument Engineering, 2024, no. 3 (148), pp. 75--90 (in Russ.). EDN: LILUCB

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