Development of Manufacturing Technology of Photo-Dielectric Sensitive Element of Ultraviolet Range on the Basis of Thin Films of Zinc Oxide

Authors: Shashin D.E., Sushentsov N.I. Published: 16.12.2019
Published in issue: #6(129)/2019  
DOI: 10.18698/0236-3933-2019-6-99-109

Category: Instrument Engineering, Metrology, Information-Measuring Instruments and Systems | Chapter: Design and Instrument Engineering Technology and Electronic Equipment  
Keywords: photodielectric effect, ultraviolet radiation, thin films, zinc oxide, magnetron sputtering

The development of ultraviolet radiation is essential for solving scientific and practical problems. A large number of application areas related to the registration of ultraviolet radiation requires the expansion of the list of materials used and the creation of new technologies for the production of ultraviolet radiation detectors. Zink oxide thin films are widely used in recording and measuring devices for the ultraviolet range, due to its wide bandgap (3.37 eV) and unique optical characteristics. The purpose of the work is to create a technology for the manufacture of photodielectric sensing element of the ultraviolet range based on zink oxide thin films. To achieve the goal, the following tasks were set and solved: to obtain an experimental sample of the photodielectric-sensing element of the ultraviolet range, investigate the photoelectric effect in zinc oxide films obtained by reactive magnetron sputtering, determine the optimal voltage and frequency of the measuring signal for the operation of the photodielectric sensing element of the ultraviolet range. The article describes the equipment and the sequence of technological operations for the production of thin films of zinc oxide and conducting electrodes by magnetron sputtering. The optimal voltage and frequency of the measuring signal for the sensing element are investigated. The spectral sensitivity of the element in the ultraviolet range was determined


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