One-dimentional statistical characteristics of binary random phase mask in the far-field diffraction pattern
Authors: Kolesnikov M.V., Trofimov N.E. | Published: 12.10.2015 |
Published in issue: #5(104)/2015 | |
DOI: 10.18698/0236-3933-2015-5-97-108 | |
Category: Informatics, Computer Engineering and Control | Chapter: Methods and Systems of Information Protection, Information Security | |
Keywords: binary random phase masks, optical Fourier transform, probability density, complex amplitude, random field |
The article describes some features of the far-field diffraction pattern from a binary random phase mask as an element of the optical information processing systems. Analytical expressions for one-dimensional probability density distributions of the amplitude, phase, and intensity are defined. The nonuniform character of these random distributions is shown. Both intensity expectation and variance dependences on the coordinates are obtained. Numerical simulation results are consistent with the obtained expressions. The expressions can be used for quality rating assessment of the optical methods for encryption and information hiding.
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